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Achieving Yield in the Nanometer Age   Featured
Publication: EE Times EDA Designline
Contributor: Mentor Graphics Corp.
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December 17, 2007 -- Can you remember the first game you ever played? It probably had very few rules, very few actions and a straightforward path to success. As you grew older, your games became more complicated. Rules became more complex and possible actions increased. Determining the best move required you to evaluate multiple options and anticipate the actions of other players. Integrated circuit design has followed a similar path.

Early on, design rules were absolute and finite. The path to yield was fairly simple; " comply with all the design rules, and yield would follow." Designers didn't need to worry too much about what happened in the fab after tape-out.

In the nanometer era, the game has changed. Yield success is much harder to achieve, because of the increased number and complexity of variables affecting manufacturability. The definition of yield itself has changed, now incorporating measures of variable power management, multi-modal performance and circuit integrity. The designer's strategy must shift from simple design rule compliance to the definition and design of the optimal layout for the highest yield.

By Anthony Nicoli. (Nicoli is the Director of Marketing for the Calibre Physical Verification, Extraction and Design for Manufacturing solutions at Mentor Graphics Corp.)

This brief introduction has been excerpted from the original copyrighted article.


View the entire article on the EE Times EDA Designline website.

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Mentor Graphics Corp.
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Keywords: EE Times EDA Designline, Mentor Graphics, design for yield, design-for-yield, DFY, design for manufacturing, design-for-manufacturing, DFM, ASIC design, EDA tools,
579/24585 12/17/2007 8251 324


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