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Samsung DFM Ready for 20nm Based on Mentor Graphics Calibre Platform   
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March 1, 2012 -- Mentor Graphics Corp. today announced that Samsung Electronics and Mentor have delivered a complete design-for-manufacturing (DFM) sign-off reference solution for Samsung’s foundry customers based on the Calibre platform. The DFM sign-off solution is available for consumer and telecommunications designs targeting advanced process nodes. Samsung has already released the Calibre kits to its customers for 32nm and 28nm, and has completed evaluation for 20nm. "We have been working closely with Mentor to provide a comprehensive and consistent ecosystem for our customers," said Kee Sup Kim, Vice President of Infrastructure Design Center, Samsung Electronics. "We have used Mentor’s 32/28-nm DFM solution on several advanced SOCs to reduce late-stage problems that could lead to delayed product releases or slower-than-expected yield ramp-up. We are currently working with Mentor to expand the DFM solution to 20-nm processes as well."

The components of the Calibre DFM platform at Samsung include the Calibre LFD product for litho simulation and hot spot pattern identification; the Calibre nmDRC and Calibre PM products for pattern-based design rule and hot-spot checking and fixing; and the Calibre YieldAnalyzer product, which is used in conjunction with the Samsung manufacturing analysis deck for DFM scoring and critical area analysis (CAA).

Go to the Mentor Graphics Corp. website to find additional information.

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Keywords: ASICs, ASIC design, EDA, EDA tools, electronic design automation, design for manufacturing, design-for-manufacturing, DFM, Mentor Graphics, Calibre
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